Etch rates of anodic silicon oxides in dilute fluoride solutions

Saved in:
Bibliographic Details
Published in:Journal of the Electrochemical Society 2003-05, Vol.150 (5), p.B205-B210
Main Authors: YAHYAOUI, F, DITTRICH, Th, AGGOUR, M, CHAZALVIEL, J.-N, OZANAM, F, RAPPICH, J
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Physics
Surface treatments
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0013-4651
1945-7111
DOI:10.1149/1.1563652