Etch rates of anodic silicon oxides in dilute fluoride solutions

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Published in:Journal of the Electrochemical Society 2003-05, Vol.150 (5), p.B205-B210
Main Authors: YAHYAOUI, F, DITTRICH, Th, AGGOUR, M, CHAZALVIEL, J.-N, OZANAM, F, RAPPICH, J
Format: Article
Language:English
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Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Physics
Surface treatments
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source Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)
subjects Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Physics
Surface treatments
title Etch rates of anodic silicon oxides in dilute fluoride solutions
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