Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-Ray Exposure Technology

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Bibliographic Details
Published in:Electrochemical and solid-state letters 2003-05, Vol.6 (5), p.G69
Main Authors: Chang, T. C., Tsai, T. M., Liu, P. T., Mor, Y. S., Chen, C. W., Sheu, J. T., Tseng, T. Y.
Format: Article
Language:English
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ISSN:1099-0062
DOI:10.1149/1.1565854