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MOCVD of PZT thin films with different precursor solutions for testing mass-production compatibility

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 2003-10, Vol.150 (10), p.C678-C687
Main Authors:	JEONG, Seehwa, SHI-ZHAO, Jin, HA, Jowoong, HYE RYOUNG KIM, PARK, Dong-Yeon, CHEOL SEONG HWANG, YOUNG KI HAN, CHEOL HOON YANG, KI YOUNG OH, KIM, Seung-Hyun, LEE, Dong-Soo
Format:	Article
Language:	English
Subjects:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
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