Nanoscale lithography of silicon dioxide using electron beam patterned carboxylic acids as localized etch initiators

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1997-02, Vol.144 (2), p.605-616
Main Authors: WHIDDEN, T. K, YANG, S.-J, JENKINS-GRAY, A, PAN, M, KOZICKI, M. N
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.1837455