TiSi2 integration in a submicron CMOS process. I: Salicide formation

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1995-06, Vol.142 (6), p.1987-1991
Main Authors: BRUN, N, KALNITSKY, A, BRUN, A
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2044228