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Effect of Low Temperature (<900°C) RTA on the Conductivity of As‐Implanted Layers and Metal to P+ Contact Resistance

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 1994-08, Vol.141 (8), p.2223-2226
Main Authors:	Kalnitsky, A., MacNaughton, R., Li, J.
Format:	Article
Language:	English
Online Access:	Get full text
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