Loading…

Characterization of double-diffused arsenic/phosphorus shallow n+p junctions with TiSi2

Saved in:

Bibliographic Details
Published in:	Journal of the Electrochemical Society 1992-12, Vol.139 (12), p.3648-3652
Main Authors:	ESHRAGHI, S. A, GEORGIOU, G. E, HA, N. T, NAKAHARA, S, LIU, R
Format:	Article
Language:	English
Subjects:	Applied sciences Electronics Exact sciences and technology Interfaces Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Citations:	Items that cite this one
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!