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Comparison of etch pit distributions and cathodoluminescence images in semi-insulating GaAs
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Published in: | Journal of the Electrochemical Society 1991-10, Vol.138 (10), p.3120-3125 |
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Language: | English |
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cited_by | cdi_FETCH-LOGICAL-c171t-a0943826a4a570f00d41ac1b9c25a24116dd2637f8dacc92f6281a1954e94a313 |
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container_end_page | 3125 |
container_issue | 10 |
container_start_page | 3120 |
container_title | Journal of the Electrochemical Society |
container_volume | 138 |
creator | ROEDEL, R. J ROWLEY, K EDWARDS, J. L MYHAIJLENKO, S |
description | |
doi_str_mv | 10.1149/1.2085379 |
format | article |
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identifier | ISSN: 0013-4651 |
ispartof | Journal of the Electrochemical Society, 1991-10, Vol.138 (10), p.3120-3125 |
issn | 0013-4651 1945-7111 |
language | eng |
recordid | cdi_crossref_primary_10_1149_1_2085379 |
source | Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List) |
subjects | Condensed matter: structure, mechanical and thermal properties Defects and impurities in crystals microstructure Direct observation of dislocations and other defects (etch pits, decoration, electron microscopy, x-ray topography, etc.) Exact sciences and technology Physics Structure of solids and liquids crystallography |
title | Comparison of etch pit distributions and cathodoluminescence images in semi-insulating GaAs |
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