Acceptor compensation in silicon induced by chemomechanical polishing

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1991-05, Vol.138 (5), p.1385-1389
Main Authors: PRIGGE, H, GERLACH, P, HAHN, P. O, SCHNEGG, A, JACOB, H
Format: Article
Language:English
Subjects:
Chemistry
Electrochemistry
Exact sciences and technology
General and physical chemistry
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2085791