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Oxygen precipitation in heavily doped silicon

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1990-02, Vol.137 (2), p.647-652
Main Authors: BAINS, S. K, GRIFFITHS, D. P, WILKES, J. G, SERIES, R. W, BARRACLOUGH, K. G
Format: Article
Language:English
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2086524