Chemical Vapor Deposition of Epitaxial Silicon from Silane at Low Temperatures: I . Very Low Pressure Deposition

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1989-08, Vol.136 (8), p.2386-2398
Main Authors: Comfort, James H., Reif, Rafael
Format: Article
Language:English
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2097378