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Study of bias-dependent etching of Si in aqueous KOH

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1987-02, Vol.134 (2), p.404-409
Main Authors: PALIK, E. D, GLEMBOCKI, O. J, HEARD, I. JR
Format: Article
Language:English
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2100468