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Reduction of surface stacking faults on N-type silicon wafers

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1986-04, Vol.133 (4), p.806-810
Main Authors: KOOB, P. W, FRAUNDORF, G. K, CRAVEN, R. A
Format: Article
Language:English
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2108681