Highly selective dry etching of polysilicon using chlorinated gas mixtures for VLSI applications

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1985-01, Vol.132 (8), p.2027-2030
Main Authors: DEGENKOLB, E, PARK, K. O, SHORTER, J. B, TABASKY, M
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Other techniques and industries
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2114275