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Enhanced diffusion in boron implanted silicon

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 1985-08, Vol.132 (8), p.2035-2036
Main Authors:	HOPKINS, L. C, SEIDEL, T. E, WILLIAMS, J. S, BEAN, J. C
Format:	Article
Language:	English
Subjects:	Condensed matter: structure, mechanical and thermal properties Defects and impurities in crystals microstructure Doping and impurity implantation in iii-v and ii-vi semiconductors Exact sciences and technology Physics Structure of solids and liquids crystallography
Citations:	Items that cite this one
Online Access:	Get full text
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