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The effects of substrate oxygen content and preannealing on the properties of silicon epitaxial layers

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 1984, Vol.131 (1), p.180-185
Main Authors:	TSUI, R. K, CURLESS, J. A, SECCO DARAGONA, F, FEJES, P. L
Format:	Article
Language:	English
Subjects:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Citations:	Items that cite this one
Online Access:	Get full text
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