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Study of electrical characteristics on thermally nitrided SiO2 (nitroxide) films

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 1984-04, Vol.131 (4), p.875-877
Main Authors:	CHEN, C.-T, TSENG, F.-C, CHANG, C.-Y, LEE, M.-K
Format:	Article
Language:	English
Subjects:	Applied sciences Electronics Exact sciences and technology Interfaces Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Citations:	Items that cite this one
Online Access:	Get full text
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