Reactive ion etching of silicon with Cl2/Ar(1)

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1983-01, Vol.130 (7), p.1592-1597
Main Authors: POGGE, H. B, BONDUR, J. A, BURKHARDT, P. J
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2120040