Poly (Fluoro Methacrylate) as Highly Sensitive, High Contrast Positive Resist

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Published in:Journal of the Electrochemical Society 1977-10, Vol.124 (10), p.1648-1651
Main Authors: Kakuchi, Masami, Sugawara, Shungo, Murase, Kei, Matsuyama, Kentaro
Format: Article
Language:English
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cited_by cdi_FETCH-LOGICAL-c295t-a950df7e83ea2ac8df7059515a92bac9d77380b9ed08b0f5c93e4f425d4d92e73
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container_end_page 1651
container_issue 10
container_start_page 1648
container_title Journal of the Electrochemical Society
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creator Kakuchi, Masami
Sugawara, Shungo
Murase, Kei
Matsuyama, Kentaro
description
doi_str_mv 10.1149/1.2133127
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title Poly (Fluoro Methacrylate) as Highly Sensitive, High Contrast Positive Resist
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