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Exposure of advanced positive and negative e-beam resists with focused ion beams

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 1993-08, Vol.140 (8), p.2332-2338
Main Authors:	MATTIUSSI, G. A, SCANLON, P. J, TEMPLETON, I. M
Format:	Article
Language:	English
Subjects:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:	Get full text
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