Loading…

A Kinetic Study of Reactive Ion Etching of Tungsten in SF 6 / O 2 RF Plasmas

Saved in:

Bibliographic Details
Published in:	Journal of the Electrochemical Society 1993-02, Vol.140 (2), p.505-512
Main Authors:	Peignon, M. C., Cardinaud, Ch, Turban, G.
Format:	Article
Language:	eng ; jpn
Citations:	Items that cite this one
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!