Mist Deposition for TFT Technology

In this work the process of mist deposition is explored as a method used to deposit organic semiconductors and gate dielectrics for TFTs. With an expanding use of TFTs in both electronic and photonic applications mist deposition offers advantages in terms of versatility, throughput and process cost....

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Bibliographic Details
Published in:ECS transactions 2006-10, Vol.3 (8), p.255-259
Main Authors: Shanmugasundaram, Karthikeyan, Price, Steven, Chang, Kyuhwan, Lee, Dong-Oh, Ruzyllo, Jerzy
Format: Article
Language:English
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Summary:In this work the process of mist deposition is explored as a method used to deposit organic semiconductors and gate dielectrics for TFTs. With an expanding use of TFTs in both electronic and photonic applications mist deposition offers advantages in terms of versatility, throughput and process cost. The method of mist deposition is first introduced and then example of results obtained with mist deposited dielectric and semiconductors thin films are discussed.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.2356361