Measurement of the Retention of Fluoride by Silicon and Silicon Dioxide Surfaces

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1967, Vol.114 (8), p.867
Main Authors: Larrabee, G. B., Heinen, K. G., Harrell, S. A.
Format: Article
Language:English
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ISSN:0013-4651
DOI:10.1149/1.2426756