Erratum: ALD and Characterization of Aluminum Oxide Deposited on Si(100) Using Tris(diethylamino) Aluminum and Water Vapor [J. Electrochem. Soc., 153, C701 (2006)]

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2007, Vol.154 (4), p.S5
Main Authors: Katamreddy, Rajesh, Inman, Ronald, Jursich, Gregory, Soulet, Axel, Takoudis, Christos
Format: Article
Language:English
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ISSN:0013-4651
DOI:10.1149/1.2536622