Improvement of the Morphological Stability by Stacking RuO[sub 2] on Ru Thin Films with Atomic Layer Deposition

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2007, Vol.154 (9), p.H773
Main Authors: Kwon, Se-Hun, Kwon, Oh-Kyum, Kim, Jae-Hoon, Jeong, Seong-Jun, Kim, Sung-Wook, Kang, Sang-Won
Format: Article
Language:English
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ISSN:0013-4651
DOI:10.1149/1.2750448