Improvement of the Morphological Stability by Stacking RuO[sub 2] on Ru Thin Films with Atomic Layer Deposition

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Published in:Journal of the Electrochemical Society 2007, Vol.154 (9), p.H773
Main Authors: Kwon, Se-Hun, Kwon, Oh-Kyum, Kim, Jae-Hoon, Jeong, Seong-Jun, Kim, Sung-Wook, Kang, Sang-Won
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Language:English
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cited_by cdi_FETCH-LOGICAL-c748-3ac58c076ccd7a40ad49d22460bb5580bb5f5f7c6dca5f82fe544633b2f562523
cites cdi_FETCH-LOGICAL-c748-3ac58c076ccd7a40ad49d22460bb5580bb5f5f7c6dca5f82fe544633b2f562523
container_end_page
container_issue 9
container_start_page H773
container_title Journal of the Electrochemical Society
container_volume 154
creator Kwon, Se-Hun
Kwon, Oh-Kyum
Kim, Jae-Hoon
Jeong, Seong-Jun
Kim, Sung-Wook
Kang, Sang-Won
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doi_str_mv 10.1149/1.2750448
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fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1149_1_2750448</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1149_1_2750448</sourcerecordid><originalsourceid>FETCH-LOGICAL-c748-3ac58c076ccd7a40ad49d22460bb5580bb5f5f7c6dca5f82fe544633b2f562523</originalsourceid><addsrcrecordid>eNotkLFOwzAURT2ARCkM_MFbGVJsx07csSoUKhVVgmwIRY5jN4YkjmwXlL-nEV3u1VnOcBC6I3hBCFs-kAXNOWZMXKAZxiRNWMbJFboO4euERLB8hty2G7z70Z3uIzgDsdHw6vzQuNYdrJItvEdZ2dbGEapxAvVt-wO8Hfcf4VgB_QTXnwiKxvawsW0X4NfGBlbRdVbBTo7aw6MeXLDRuv4GXRrZBn17_jkqNk_F-iXZ7Z-369UuUTkTSSoVFwrnmVJ1LhmWNVvWlLIMVxXnYlrDTa6yWkluBDWaM5alaUUNzyin6Rzd_2uVdyF4bcrB2076sSS4nOKUpDzHSf8A1yhZZg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Improvement of the Morphological Stability by Stacking RuO[sub 2] on Ru Thin Films with Atomic Layer Deposition</title><source>Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)</source><creator>Kwon, Se-Hun ; Kwon, Oh-Kyum ; Kim, Jae-Hoon ; Jeong, Seong-Jun ; Kim, Sung-Wook ; Kang, Sang-Won</creator><creatorcontrib>Kwon, Se-Hun ; Kwon, Oh-Kyum ; Kim, Jae-Hoon ; Jeong, Seong-Jun ; Kim, Sung-Wook ; Kang, Sang-Won</creatorcontrib><identifier>ISSN: 0013-4651</identifier><identifier>DOI: 10.1149/1.2750448</identifier><language>eng</language><ispartof>Journal of the Electrochemical Society, 2007, Vol.154 (9), p.H773</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c748-3ac58c076ccd7a40ad49d22460bb5580bb5f5f7c6dca5f82fe544633b2f562523</citedby><cites>FETCH-LOGICAL-c748-3ac58c076ccd7a40ad49d22460bb5580bb5f5f7c6dca5f82fe544633b2f562523</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,4022,27922,27923,27924</link.rule.ids></links><search><creatorcontrib>Kwon, Se-Hun</creatorcontrib><creatorcontrib>Kwon, Oh-Kyum</creatorcontrib><creatorcontrib>Kim, Jae-Hoon</creatorcontrib><creatorcontrib>Jeong, Seong-Jun</creatorcontrib><creatorcontrib>Kim, Sung-Wook</creatorcontrib><creatorcontrib>Kang, Sang-Won</creatorcontrib><title>Improvement of the Morphological Stability by Stacking RuO[sub 2] on Ru Thin Films with Atomic Layer Deposition</title><title>Journal of the Electrochemical Society</title><issn>0013-4651</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNotkLFOwzAURT2ARCkM_MFbGVJsx07csSoUKhVVgmwIRY5jN4YkjmwXlL-nEV3u1VnOcBC6I3hBCFs-kAXNOWZMXKAZxiRNWMbJFboO4euERLB8hty2G7z70Z3uIzgDsdHw6vzQuNYdrJItvEdZ2dbGEapxAvVt-wO8Hfcf4VgB_QTXnwiKxvawsW0X4NfGBlbRdVbBTo7aw6MeXLDRuv4GXRrZBn17_jkqNk_F-iXZ7Z-369UuUTkTSSoVFwrnmVJ1LhmWNVvWlLIMVxXnYlrDTa6yWkluBDWaM5alaUUNzyin6Rzd_2uVdyF4bcrB2076sSS4nOKUpDzHSf8A1yhZZg</recordid><startdate>2007</startdate><enddate>2007</enddate><creator>Kwon, Se-Hun</creator><creator>Kwon, Oh-Kyum</creator><creator>Kim, Jae-Hoon</creator><creator>Jeong, Seong-Jun</creator><creator>Kim, Sung-Wook</creator><creator>Kang, Sang-Won</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2007</creationdate><title>Improvement of the Morphological Stability by Stacking RuO[sub 2] on Ru Thin Films with Atomic Layer Deposition</title><author>Kwon, Se-Hun ; Kwon, Oh-Kyum ; Kim, Jae-Hoon ; Jeong, Seong-Jun ; Kim, Sung-Wook ; Kang, Sang-Won</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c748-3ac58c076ccd7a40ad49d22460bb5580bb5f5f7c6dca5f82fe544633b2f562523</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kwon, Se-Hun</creatorcontrib><creatorcontrib>Kwon, Oh-Kyum</creatorcontrib><creatorcontrib>Kim, Jae-Hoon</creatorcontrib><creatorcontrib>Jeong, Seong-Jun</creatorcontrib><creatorcontrib>Kim, Sung-Wook</creatorcontrib><creatorcontrib>Kang, Sang-Won</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kwon, Se-Hun</au><au>Kwon, Oh-Kyum</au><au>Kim, Jae-Hoon</au><au>Jeong, Seong-Jun</au><au>Kim, Sung-Wook</au><au>Kang, Sang-Won</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Improvement of the Morphological Stability by Stacking RuO[sub 2] on Ru Thin Films with Atomic Layer Deposition</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2007</date><risdate>2007</risdate><volume>154</volume><issue>9</issue><spage>H773</spage><pages>H773-</pages><issn>0013-4651</issn><doi>10.1149/1.2750448</doi></addata></record>
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language eng
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title Improvement of the Morphological Stability by Stacking RuO[sub 2] on Ru Thin Films with Atomic Layer Deposition
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T09%3A23%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Improvement%20of%20the%20Morphological%20Stability%20by%20Stacking%20RuO%5Bsub%202%5D%20on%20Ru%20Thin%20Films%20with%20Atomic%20Layer%20Deposition&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=Kwon,%20Se-Hun&rft.date=2007&rft.volume=154&rft.issue=9&rft.spage=H773&rft.pages=H773-&rft.issn=0013-4651&rft_id=info:doi/10.1149/1.2750448&rft_dat=%3Ccrossref%3E10_1149_1_2750448%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c748-3ac58c076ccd7a40ad49d22460bb5580bb5f5f7c6dca5f82fe544633b2f562523%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true