Influence of Phase Separation on Electrical Properties of ALD Hf–Silicate Films with Various Si Concentrations

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Bibliographic Details
Published in:Electrochemical and solid-state letters 2008, Vol.11 (5), p.H121
Main Authors: Park, Tae Joo, Kim, Jeong Hwan, Jang, Jae Hyuck, Hwang, Cheol Seong, Yoo, Jeong Ho
Format: Article
Language:English
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ISSN:1099-0062
DOI:10.1149/1.2844717