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Optical Bleaching of Thin Film Ge on Si
Thin film Ge on Si is a potential active material candidate for electrically pumped monolithically integrated Si-based light emitters. Theoretical analysis has shown that a combination of strain and n-type doping can modify the band structure of Ge so that it exhibits direct bandgap properties. Direc...
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Main Authors: | , , , |
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Format: | Conference Proceeding |
Language: | English |
Citations: | Items that cite this one |
Online Access: | Get full text |
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Summary: | Thin film Ge on Si is a potential active material candidate for electrically pumped monolithically integrated Si-based light emitters. Theoretical analysis has shown that a combination of strain and n-type doping can modify the band structure of Ge so that it exhibits direct bandgap properties. Direct band-to- band optical transition is observed from the room temperature photoluminescence at around 1550nm. An optical bleaching ef- fect occurring in lock-in pump-probe measurements indicates a precursor to optical net gain. |
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ISSN: | 1938-5862 1938-6737 |
DOI: | 10.1149/1.2986848 |