Polycrystalline Diamond (PCD) Shaving Dresser: The Ultimate Diamond Disk (UDD) for CMP Pad Conditioning

All conventional pad conditioners dress the CMP pad with discrete diamond grits of random orientation. With the advent of polycrystalline diamond (PCD) dressers, the pad conditioning can be performed with an unprecedented regularity. The result is a total elimination of "killer asperities"...

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Bibliographic Details
Main Authors: Sung, James C., Chou, Cheng-Shiang, Chen, Ying-Tung, Chou, Chih-Chung, Pai, Yang-Liang, Hu, Shao-Chung, Sung, Michael
Format: Conference Proceeding
Language:English
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Summary:All conventional pad conditioners dress the CMP pad with discrete diamond grits of random orientation. With the advent of polycrystalline diamond (PCD) dressers, the pad conditioning can be performed with an unprecedented regularity. The result is a total elimination of "killer asperities" that may scratch the soft copper layer or porous dielectric layer. Moreover, the PCD dressers may be constructed to form a blade shaver so pad disruption during conditioning can be minimized. As a result, the original pad polymers can be preserved for polishing wafers. This ultimate diamond disk (UDD) has transformed stick slipping pad destruction to smooth shaving pad construction. UDD is particularly suitable for dressing CMP pads for polishing 22 nm interconnects, in particularly, with the anticipated debut of 450 mm pancake wafers scheduled for 2012.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.3096496