ILD CMP with Silica Abrasive Particles: Interfacial Removal Kinetics and Effect of Pad Surface Textures

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2010, Vol.157 (11), p.H1061
Main Authors: Li, Shoutian, Gaudet, Greg, Sun, Fred, Naman, Ananth
Format: Article
Language:English
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ISSN:0013-4651
DOI:10.1149/1.3486806