Cymer LPP EUV Source System Development Status

In this paper, the technologies developed by Cymer to deliver clean EUV power will be reviewed. A high average power (>20kW) pulsed CO2 laser is used to create a Sn plasma by irradiating 30μm Sn droplets at a repetition rate of approximately 50kHz. The EUV light emitted by the Sn plasma is collec...

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Main Authors: Lin, Benjamin, La Fontaine, Bruno, Brandt, David, Farrar, Nigel
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La Fontaine, Bruno
Brandt, David
Farrar, Nigel
description In this paper, the technologies developed by Cymer to deliver clean EUV power will be reviewed. A high average power (>20kW) pulsed CO2 laser is used to create a Sn plasma by irradiating 30μm Sn droplets at a repetition rate of approximately 50kHz. The EUV light emitted by the Sn plasma is collected using a 5sr multi-layer mirror (MLM) collector and refocused at the intermediate focus (IF). The integrity of the MLM collector is maintained over time using debris mitigation techniques based on H2. A number of diagnostics are used to characterize the EUV light past IF. We will describe the performance of multiple laser-produced plasma (LPP) EUV sources, integrated with a 5sr MLM collector and debris mitigation.
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title Cymer LPP EUV Source System Development Status
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