Effluent Management for Non-Oxidizing Plasma Strip Processes

This paper reports on the techniques employed to control the re-deposition of the partially dissociated organic photoresist (PR) by-products in advanced non-oxidizing strip processes developed to meet the PR removal requirements of future technology nodes. System features, such as the design of heat...

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Bibliographic Details
Main Authors: Luo, Shijian, Waldfried, Carlo, Escorcia, Orlando, Berry, Ivan, Geissbühler, Phillip, Srivastava, Aseem, Roh, Dwight
Format: Conference Proceeding
Language:English
Online Access:Get full text
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Summary:This paper reports on the techniques employed to control the re-deposition of the partially dissociated organic photoresist (PR) by-products in advanced non-oxidizing strip processes developed to meet the PR removal requirements of future technology nodes. System features, such as the design of heated process chamber walls and an on-board, RF-based oxygen plasma effluent abatement system are described in detail. The performance of these features to prevent or eliminate hydrocarbon buildup and manage effluent with non-oxidizing strip processes is also presented and discussed.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.3567617