Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF 6 /O 2 /SiF 4

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Bibliographic Details
Published in:ECS journal of solid state science and technology 2013, Vol.2 (6), p.N131-N139
Main Authors: Zhang, Liping, Ljazouli, Rami, Lefaucheux, Philippe, Tillocher, Thomas, Dussart, Remi, Mankelevich, Yuri A., de Marneffe, Jean-Francois, de Gendt, Stefan, Baklanov, Mikhail R.
Format: Article
Language:English
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ISSN:2162-8769
2162-8777
DOI:10.1149/2.001306jss