Temperature and RF Current Sensor Wafers for Plasma Etching

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2012-01, Vol.159 (1), p.H5-H10
Main Authors: Milenin, A. P., Demand, M., Boullart, W., Arleo, P.
Format: Article
Language:English
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ISSN:0013-4651
1945-7111
DOI:10.1149/2.010201jes