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Water Outlet Design of Wet Cleaning Bath for 300-mm Diameter Silicon Wafers
Water motions influenced by an outlet of a batch-type 300-mm diameter silicon wafer wet cleaning bath were experimentally and numerically studied in order to quickly remove the contaminants from the bath. The outlet consisting of a pinhole arrays (PA) near the top edge of the bath side wall was desi...
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Published in: | ECS journal of solid state science and technology 2018, Vol.7 (9), p.N123-N127 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Water motions influenced by an outlet of a batch-type 300-mm diameter silicon wafer wet cleaning bath were experimentally and numerically studied in order to quickly remove the contaminants from the bath. The outlet consisting of a pinhole arrays (PA) near the top edge of the bath side wall was designed and evaluated along with an ordinary overflow (OF) outlet. The experiment showed that the amount of a blue-colored ink, used as a tracer, in the bath having both the OF- and the PA-outlets decreased faster than that in the bath having only the OF-outlet. Simultaneously, the amount of the blue-colored ink that returned to the bath bottom was reduced by using both the PA-outlet and the OF-outlet. The numerical calculations also showed that particles in the bath quickly went out through the PA-outlet. |
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ISSN: | 2162-8769 2162-8769 2162-8777 |
DOI: | 10.1149/2.0171809jss |