Comparison between Effects of PECVD-SiO x and Thermal ALD-AlO x Passivation Layers on Characteristics of Amorphous InGaZnO TFTs

Saved in:
Bibliographic Details
Published in:ECS journal of solid state science and technology 2015, Vol.4 (7), p.Q61-Q65
Main Authors: Tanaka, Jun, Ueoka, Yoshihiro, Yoshitsugu, Koji, Fujii, Mami, Ishikawa, Yasuaki, Uraoka, Yukiharu, Takechi, Kazushige, Tanabe, Hiroshi
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:2162-8769
2162-8777
DOI:10.1149/2.0231507jss