Adhesion Study between Electroless Seed Layers and Build-up Dielectric Film Substrates

• Published in: Journal of the Electrochemical Society 2013-01, Vol.160 (3), p.D107-D110
• Main Authors: Sun, Jiang-Yan, Hong, Do-Hyeong, Ahn, Key-one, Park, Se-Hoon, Park, Ji-Yeon, Kim, Young-Ho
• Format: Article
• Language: English
• ISSN: 0013-4651; 1945-7111
• DOI: 10.1149/2.049303jes

The adhesion between the electroless seed layer and the buildup film substrates was studied. After the buildup film was laminated, the buildup film surface was modified by a desmear treatment from 0 to 30 min, and electroless Cu or electroless Ni-P was plated as the seed layer on the buildup film. The Cu was then electroplated, and the post curing was carried out at 180°C for 2 h before or after Cu electroplating. The adhesion strength between the electroless seed layers and the buildup film substrates was measured by the 90° peel test. Increasing the desmear treatment time made the buildup film surface rougher, and consequently enhanced the adhesion strength of the electroless Cu and electroless Ni-P to the film. Under the same conditions, the electroless Ni-P specimen showed a higher peel strength than the electroless Cu specimens. Post curing significantly increased the adhesion strength due to the increased ductility of the metal layer after heat-treatment. In addition, the peel strength decreased as the thickness of the seed layer increased, which was also related to the mechanical properties of each metal layer.