Thickness Measurement of V 2 O 5 Nanometric Thin Films Using a Portable XRF

Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and de...

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Published in:Journal of spectroscopy (Hindawi) 2016, Vol.2016, p.1-7
Main Authors: Lopes, Fabio, Cardozo Amorin, Luís Henrique, da Silva Martins, Larissa, Urbano, Alexandre, Roberto Appoloni, Carlos, Cesareo, Roberto
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description Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V 2 O 5 nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensity K α of calcium present in the glass. It is shown through the present paper that the radiation intensity of calcium K α rays is proportional to film thickness in nanometric films of vanadium deposited on the glass surface.
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