Photo-curable Resins for UV Nanoinprint and their Evaluation Methods

Nanoimprint lithography has been attracted attention as a promising nano fabrication technology. Especially UV-NIL, using photo-curable resins as transcribed materials, is enable to reduce the process cost and is expected to be used for mass production. Properties required for the UV-NIL resins are...

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Bibliographic Details
Published in:KOBUNSHI RONBUNSHU 2009, Vol.66(3), pp.88-96
Main Authors: SAKAI, Nobuji, HIRASAWA, Tanano
Format: Article
Language:Japanese
Subjects:
Adhesive Force
Electro Deposition
Mold
Nano Fabrication
Photo-curable Resin
UV-Nanoimprint
UV-NIL
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Summary:Nanoimprint lithography has been attracted attention as a promising nano fabrication technology. Especially UV-NIL, using photo-curable resins as transcribed materials, is enable to reduce the process cost and is expected to be used for mass production. Properties required for the UV-NIL resins are classified in “basic properties” and “application properties”. In this paper, a number of evaluation methods for the resins were illustrated and the differences of seven kinds of resins are described. The basic properties contribute to the high-throughput process. Thus the release property, mechanical property and photo-curing rate were evaluated. As the release property is especially important, modified investigations have been carried out. On the other hand, the application properties vary depending on the products, being related to their function. As examples, the experimental results of thermal stability, transparency, application for roll-to-roll transcription, dry etching process and plating process were shown.
ISSN:0386-2186
1881-5685
DOI:10.1295/koron.66.88