Ultra-low stress SiO 2 coatings by ion beam sputtering deposition

High mechanical stress can affect the performance of multilayer thin film optical coatings, causing wavefront aberrations. This is particularly important if the multilayer stack is deposited onto thin substrates, such as those used in adaptive optics. Stress in thin film coatings is dependent on the...

Full description

Saved in:
Bibliographic Details
Published in:Applied optics (2004) 2020-03, Vol.59 (7), p.1871
Main Authors: Davenport, Aaron, Randel, Emmett, Menoni, Carmen S
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:High mechanical stress can affect the performance of multilayer thin film optical coatings, causing wavefront aberrations. This is particularly important if the multilayer stack is deposited onto thin substrates, such as those used in adaptive optics. Stress in thin film coatings is dependent on the deposition process, and ion beam sputtering (IBS) thin films are known to have high compressive stress. In the present work, we show that stress in IBS $ {{\rm SiO}_2} $SiO thin films can be reduced from 490 MPa to 48 MPa using high-energy $ {{\rm O}_2} $O assist ion bombardment during deposition while maintaining high optical quality. A comparison of the reduction of stress in $ {{\rm SiO}_2} $SiO deposited from oxide and metal targets is provided.
ISSN:1559-128X
2155-3165
DOI:10.1364/AO.380844