Light trapping in ultrathin 25  μm exfoliated Si solar cells

• Published in: Applied optics (2004) 2014-09, Vol.53 (27), p.6140
• Main Authors: Hilali, Mohamed M, Saha, Sayan, Onyegam, Emmanuel, Rao, Rajesh, Mathew, Leo, Banerjee, Sanjay K
• Format: Article
• Language: English
• ISSN: 1559-128X; 2155-3165
• DOI: 10.1364/AO.53.006140

The optical absorption in 25-μm-thick, single-crystal Si foils fabricated using a novel exfoliation technique for solar cells is studied and improved in this work. Various light-trapping and optical absorption enhancement schemes implemented show that it is possible to substantially narrow the gap in optical absorption loss between the 25 μm Si foils and industry-standard 180-μm-thick Si wafer solar cells. An improvement of absorption by 58% in the near-infrared (740-1200 nm) range is observed for the 25 μm monocrystalline Si substrates with the use of antireflective coating and texturing. The back reflectance of the metal foil that provides mechanical support to the ultrathin Si semiconductor-on-metal foils is extracted to be ∼51.5%, based on the reflectance matching with the simulated escape reflectance in the sub-bandgap region. The back reflectance is enhanced to ∼58% by incorporating an intermediate silicon nitride layer on the back between the Si and the metal. The incorporation of Al as an improved metal reflector on top of the silicon nitride at the backside of the solar cell results in a 5.8 times enhancement in optical path length as a consequence of the improved effective back reflectance of ∼95%. A thin Si foil solar cell with an unoptimized amorphous Si/crystalline Si heterojunction with intrinsic-thin-layer design with implementation of such light-trapping schemes shows an efficiency of 13.28% with a short-circuit current density (JSC) of 35.97  mA/cm2, which approaches the JSC of industrial wafer-based Si solar cells.