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Soft-x-ray projection lithography : printing of 0.2-μm features using a 20 : 1 reduction

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Bibliographic Details
Published in:	Optics letters 1990-05, Vol.15 (10), p.529-531
Main Authors:	BERREMAN, D. W, BJORKHOLM, J. E, SZETO, L. H, TENNANT, D. M, WFASKIEWCZ, W. K, WHITE, D. L, WINDT, D. L, WOOD, O. R, BRUNING, J. H, EICHNER, L, FREEMAN, R. R, JEWELL, T. E, MANSFIELD, W. M, MACDOWELL, A. A, O'MALLEY, M. L, RAAB, E. L, SILFVAST, W. T
Format:	Article
Language:	English
Subjects:	Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Physics
Citations:	Items that this one cites Items that cite this one
Online Access:	Get full text
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