Optical Characterization of Ultra-Thin Iron and Iron Oxide Films

Ultra-thin films of 57Fe deposited on silicon substrates and SiOxCyHz support layers and subsequently oxidized in laboratory atmosphere are studied by two optical methods: the combination of UV/VIS/NIR spectroscopic ellipsometry and spectrophotometry, used to find layer thicknesses and optical const...

Full description

Saved in:
Bibliographic Details
Published in:E-journal of surface science and nanotechnology 2009/04/04, Vol.7, pp.486-490
Main Authors: Necas, David, Zajícková, Lenka, Franta, Daniel, St'ahel, Pavel, Mikulík, Petr, Meduna, Mojmír, Valtr, Miroslav
Format: Article
Language:English
Subjects:
Ellipsometry
Iron
Iron oxide
Spectrophotometry
Thin films
X-ray reflection
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Ultra-thin films of 57Fe deposited on silicon substrates and SiOxCyHz support layers and subsequently oxidized in laboratory atmosphere are studied by two optical methods: the combination of UV/VIS/NIR spectroscopic ellipsometry and spectrophotometry, used to find layer thicknesses and optical constants, and X-ray specular reflectometry, used to obtain the electron density depth profile. The results of both methods are compared and found to be in a relatively good agreement. [DOI: 10.1380/ejssnt.2009.486]
ISSN:1348-0391
1348-0391
DOI:10.1380/ejssnt.2009.486