Low-temperature fabrication of high-quality (Ba, Sr)TiO 3 films using charged liquid cluster beam method

Low-temperature deposition of high-quality (Ba, Sr)TiO 3 (BST) thin films was achieved in air on Pt/Ti/SiO 2 /Si substrates using the charged liquid cluster beam (CLCB) method. The Ba, Sr, and Ti precursors were synthesized using alkoxy carboxylate ligands to tailor their physical properties to the...

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Bibliographic Details
Published in:Journal of materials research 2002-08, Vol.17 (8), p.1888-1891
Main Authors: Choi, Hyungsoo, Park, Sungho, Yang, Yi, Kang, HoChul, Kim, Kyekyoon (Kevin), Sung, M. Y., Jang, Ho G.
Format: Article
Language:English
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Summary:Low-temperature deposition of high-quality (Ba, Sr)TiO 3 (BST) thin films was achieved in air on Pt/Ti/SiO 2 /Si substrates using the charged liquid cluster beam (CLCB) method. The Ba, Sr, and Ti precursors were synthesized using alkoxy carboxylate ligands to tailor their physical properties to the CLCB process. The as-deposited BST films fabricated at substrate temperatures as low as 280 °C exhibited high purity. The leakage current density and dielectric constant of the film, deposited at 300 °C and subsequently annealed at 700 °C, were 2.5 × 10 −9 A/cm 2 at 1.5 V and 305, respectively.
ISSN:0884-2914
2044-5326
DOI:10.1557/JMR.2002.0279