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46.3: Ultra-flat ITO Films for Light Emitting Polymer Applications
The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting polymer applications with a RMS roughness of less t...
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Published in: | SID International Symposium Digest of technical papers 2000-05, Vol.31 (1), p.1084-1087 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting polymer applications with a RMS roughness of less than 1 nm can be prepared. The flat surface structure also improves the optical transmittance of ITO films being beneficial for light emitting polymer applications. The performance of light emitting polymer display devices using ultra‐flat ITO films is correlated to the ITO process variation. |
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ISSN: | 0097-966X 2168-0159 |
DOI: | 10.1889/1.1832853 |