46.3: Ultra-flat ITO Films for Light Emitting Polymer Applications

The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting polymer applications with a RMS roughness of less t...

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Published in:SID International Symposium Digest of technical papers 2000-05, Vol.31 (1), p.1084-1087
Main Authors: Klöppel, A., Trube, J., Hoffmann, U., Burroughes, J. H., Heeks, S. K., Gunner, A., Ramshaw, T.
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cited_by cdi_FETCH-LOGICAL-c1527-30f8180366448d6db3d18445583584b75848d64700c963f50c0c0c5fd4084ce83
cites cdi_FETCH-LOGICAL-c1527-30f8180366448d6db3d18445583584b75848d64700c963f50c0c0c5fd4084ce83
container_end_page 1087
container_issue 1
container_start_page 1084
container_title SID International Symposium Digest of technical papers
container_volume 31
creator Klöppel, A.
Trube, J.
Hoffmann, U.
Burroughes, J. H.
Heeks, S. K.
Gunner, A.
Ramshaw, T.
description The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting polymer applications with a RMS roughness of less than 1 nm can be prepared. The flat surface structure also improves the optical transmittance of ITO films being beneficial for light emitting polymer applications. The performance of light emitting polymer display devices using ultra‐flat ITO films is correlated to the ITO process variation.
doi_str_mv 10.1889/1.1832853
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fullrecord <record><control><sourceid>istex_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1889_1_1832853</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>ark_67375_WNG_MFD4MX71_W</sourcerecordid><originalsourceid>FETCH-LOGICAL-c1527-30f8180366448d6db3d18445583584b75848d64700c963f50c0c0c5fd4084ce83</originalsourceid><addsrcrecordid>eNp1j81OAjEUhRujiYgufINuXRRa-jvuEBgkASERArtmmJlitcOQtony9g6BuDM3uefm5jsnOQA8EtwhSiVd0gjtKU6vQKtHhEKY8OQatDBOJEqE2NyCuxA-MaaUsaQFXpjo0Ge4ctFnyLgswslyDlPrqgBN7eHU7j4iHFU2RrvfwUXtjlXpYf9wcDbPoq334R7cmMyF8uGibbBKR8vBK5rOx5NBf4pywnsSUWwUUZgKwZgqRLGlBVGMca4oV2wrm9W8mcQ4TwQ1HOen4aZgWLG8VLQNns65ua9D8KXRB2-rzB81wfpUXhN9Kd-w3TP7bV15_B_U78Plorlk40Bnhw2x_PlzZP5LC0kl1-u3sZ6lQzbbSKLX9BdhEGYG</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>46.3: Ultra-flat ITO Films for Light Emitting Polymer Applications</title><source>Wiley</source><creator>Klöppel, A. ; Trube, J. ; Hoffmann, U. ; Burroughes, J. H. ; Heeks, S. K. ; Gunner, A. ; Ramshaw, T.</creator><creatorcontrib>Klöppel, A. ; Trube, J. ; Hoffmann, U. ; Burroughes, J. H. ; Heeks, S. K. ; Gunner, A. ; Ramshaw, T.</creatorcontrib><description>The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting polymer applications with a RMS roughness of less than 1 nm can be prepared. The flat surface structure also improves the optical transmittance of ITO films being beneficial for light emitting polymer applications. The performance of light emitting polymer display devices using ultra‐flat ITO films is correlated to the ITO process variation.</description><identifier>ISSN: 0097-966X</identifier><identifier>EISSN: 2168-0159</identifier><identifier>DOI: 10.1889/1.1832853</identifier><language>eng</language><publisher>Oxford, UK: Blackwell Publishing Ltd</publisher><ispartof>SID International Symposium Digest of technical papers, 2000-05, Vol.31 (1), p.1084-1087</ispartof><rights>2000 Society for Information Display</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c1527-30f8180366448d6db3d18445583584b75848d64700c963f50c0c0c5fd4084ce83</citedby><cites>FETCH-LOGICAL-c1527-30f8180366448d6db3d18445583584b75848d64700c963f50c0c0c5fd4084ce83</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids></links><search><creatorcontrib>Klöppel, A.</creatorcontrib><creatorcontrib>Trube, J.</creatorcontrib><creatorcontrib>Hoffmann, U.</creatorcontrib><creatorcontrib>Burroughes, J. H.</creatorcontrib><creatorcontrib>Heeks, S. K.</creatorcontrib><creatorcontrib>Gunner, A.</creatorcontrib><creatorcontrib>Ramshaw, T.</creatorcontrib><title>46.3: Ultra-flat ITO Films for Light Emitting Polymer Applications</title><title>SID International Symposium Digest of technical papers</title><description>The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting polymer applications with a RMS roughness of less than 1 nm can be prepared. The flat surface structure also improves the optical transmittance of ITO films being beneficial for light emitting polymer applications. The performance of light emitting polymer display devices using ultra‐flat ITO films is correlated to the ITO process variation.</description><issn>0097-966X</issn><issn>2168-0159</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNp1j81OAjEUhRujiYgufINuXRRa-jvuEBgkASERArtmmJlitcOQtony9g6BuDM3uefm5jsnOQA8EtwhSiVd0gjtKU6vQKtHhEKY8OQatDBOJEqE2NyCuxA-MaaUsaQFXpjo0Ge4ctFnyLgswslyDlPrqgBN7eHU7j4iHFU2RrvfwUXtjlXpYf9wcDbPoq334R7cmMyF8uGibbBKR8vBK5rOx5NBf4pywnsSUWwUUZgKwZgqRLGlBVGMca4oV2wrm9W8mcQ4TwQ1HOen4aZgWLG8VLQNns65ua9D8KXRB2-rzB81wfpUXhN9Kd-w3TP7bV15_B_U78Plorlk40Bnhw2x_PlzZP5LC0kl1-u3sZ6lQzbbSKLX9BdhEGYG</recordid><startdate>200005</startdate><enddate>200005</enddate><creator>Klöppel, A.</creator><creator>Trube, J.</creator><creator>Hoffmann, U.</creator><creator>Burroughes, J. H.</creator><creator>Heeks, S. K.</creator><creator>Gunner, A.</creator><creator>Ramshaw, T.</creator><general>Blackwell Publishing Ltd</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>200005</creationdate><title>46.3: Ultra-flat ITO Films for Light Emitting Polymer Applications</title><author>Klöppel, A. ; Trube, J. ; Hoffmann, U. ; Burroughes, J. H. ; Heeks, S. K. ; Gunner, A. ; Ramshaw, T.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1527-30f8180366448d6db3d18445583584b75848d64700c963f50c0c0c5fd4084ce83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Klöppel, A.</creatorcontrib><creatorcontrib>Trube, J.</creatorcontrib><creatorcontrib>Hoffmann, U.</creatorcontrib><creatorcontrib>Burroughes, J. H.</creatorcontrib><creatorcontrib>Heeks, S. K.</creatorcontrib><creatorcontrib>Gunner, A.</creatorcontrib><creatorcontrib>Ramshaw, T.</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><jtitle>SID International Symposium Digest of technical papers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Klöppel, A.</au><au>Trube, J.</au><au>Hoffmann, U.</au><au>Burroughes, J. H.</au><au>Heeks, S. K.</au><au>Gunner, A.</au><au>Ramshaw, T.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>46.3: Ultra-flat ITO Films for Light Emitting Polymer Applications</atitle><jtitle>SID International Symposium Digest of technical papers</jtitle><date>2000-05</date><risdate>2000</risdate><volume>31</volume><issue>1</issue><spage>1084</spage><epage>1087</epage><pages>1084-1087</pages><issn>0097-966X</issn><eissn>2168-0159</eissn><abstract>The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting polymer applications with a RMS roughness of less than 1 nm can be prepared. The flat surface structure also improves the optical transmittance of ITO films being beneficial for light emitting polymer applications. The performance of light emitting polymer display devices using ultra‐flat ITO films is correlated to the ITO process variation.</abstract><cop>Oxford, UK</cop><pub>Blackwell Publishing Ltd</pub><doi>10.1889/1.1832853</doi><tpages>4</tpages></addata></record>
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title 46.3: Ultra-flat ITO Films for Light Emitting Polymer Applications
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-18T23%3A22%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-istex_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=46.3:%20Ultra-flat%20ITO%20Films%20for%20Light%20Emitting%20Polymer%20Applications&rft.jtitle=SID%20International%20Symposium%20Digest%20of%20technical%20papers&rft.au=Kl%C3%B6ppel,%20A.&rft.date=2000-05&rft.volume=31&rft.issue=1&rft.spage=1084&rft.epage=1087&rft.pages=1084-1087&rft.issn=0097-966X&rft.eissn=2168-0159&rft_id=info:doi/10.1889/1.1832853&rft_dat=%3Cistex_cross%3Eark_67375_WNG_MFD4MX71_W%3C/istex_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c1527-30f8180366448d6db3d18445583584b75848d64700c963f50c0c0c5fd4084ce83%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true