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Applications of OLEDs that use VUV-CVD films
— In photo‐CVD (chemical vapor deposition) in which vacuum‐ultraviolet (VUV) excimer lamps (VUV‐CVD) are used, thin films were deposited at room temperature because VUV photons have the energy to decompose material gases. For the use of OMCTS (octamethylcyclotetrasiloxane), an organic siloxane, we c...
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Published in: | Journal of the Society for Information Display 2005-05, Vol.13 (5), p.453-457 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | — In photo‐CVD (chemical vapor deposition) in which vacuum‐ultraviolet (VUV) excimer lamps (VUV‐CVD) are used, thin films were deposited at room temperature because VUV photons have the energy to decompose material gases. For the use of OMCTS (octamethylcyclotetrasiloxane), an organic siloxane, we can deposit a self‐flatness film for high‐pressure conditions. The reactants generated by VUV photons have excellent migration characteristics for this condition. Also, the VUV‐CVD film demonstrates low stress, comparatively hard hardness, good electrical properties, and good thermal resistance. The VUV‐CVD film is optimum for planarizing film in the over‐coating deposition step in the production of OLEDs, which requires a low‐temperature process. |
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ISSN: | 1071-0922 1938-3657 |
DOI: | 10.1889/1.1927739 |