16.5L: Late-News-Paper: Non-Contact OLED Color Patterning by Radiation-Induced Sublimation Transfer (RIST)

A non‐contact vacuum‐patterning method is described to sublime OLED materials from a donor to a substrate. Radiation‐induced sublimation transfer (RIST) enables the manufacture of full‐color OLED devices on large‐scale mother glass, at high yield, by eliminating precision shadow masks and donor cont...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2005-05, Vol.36 (1), p.972-975
Main Authors: Boroson, Michael, Tutt, Lee, Nguyen, Kelvin, Preuss, Don, Culver, Myron, Phelan, Giana
Format: Article
Language:English
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Summary:A non‐contact vacuum‐patterning method is described to sublime OLED materials from a donor to a substrate. Radiation‐induced sublimation transfer (RIST) enables the manufacture of full‐color OLED devices on large‐scale mother glass, at high yield, by eliminating precision shadow masks and donor contact, which are used in evaporation and laser‐induced thermal imaging, respectively. Device performance (color, efficiency, stability) is reported for RIST devices and evaporated controls; comparisons to evaporation and other patterning methods are described, and a full‐color AM‐OLED device was fabricated.
ISSN:0097-966X
2168-0159
DOI:10.1889/1.2036612