Digital lithographic processing for large-area electronics

— A non‐contact jet‐printed mask‐patterning process is described. By combining digital imaging with jet printing, digital lithography was used to pattern a‐Si:H‐based electronics on glass and plastic substrates in place of conventional photolithography. This digital lithographic process is capable o...

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Bibliographic Details
Published in:Journal of the Society for Information Display 2007-07, Vol.15 (7), p.463-470
Main Authors: Wong, William S., Chabinyc, Michael L., Limb, Scott, Ready, Steven E., Lujan, René, Daniel, Jurgen, Street, Robert A.
Format: Article
Language:English
Subjects:
amorphous silicon
arrays
color filters
Flexible electronics
image sensor
jet printing
thin-film transistor
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Summary:— A non‐contact jet‐printed mask‐patterning process is described. By combining digital imaging with jet printing, digital lithography was used to pattern a‐Si:H‐based electronics on glass and plastic substrates in place of conventional photolithography. This digital lithographic process is capable of layer‐to‐layer registration of ±5 μm using electronic mask files that are directly jet printed onto a surface. Aminimum feature size of 50 μm was used to create 180 × 180 element backplanes having 75‐dpi resolution for display and image‐sensor applications. By using a secondary mask process, the minimum feature size can be reduced down to ∼15 μm for fabrication of short‐channel thin‐film transistors. The same process was also used to pattern black‐matrix wells in fabricating color‐filter top plates in LCD panels.
ISSN:1071-0922
1938-3657
DOI:10.1889/1.2759551